- 专利标题： Lithographic apparatus and device manufacturing method
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申请号： US11482122申请日： 2006-07-07
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公开(公告)号： US20070132979A1公开(公告)日： 2007-06-14
- 发明人: Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
- 申请人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03253636.9 20030609; EP03255395.0 20030829; EP03257068.1 20031110
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
公开/授权文献
- US08154708B2 Lithographic apparatus and device manufacturing method 公开/授权日：2012-04-10