A composition comprising a stable mixture of at least one stain resist agent, at least one soil resist agent, and at least one coapplication enhancer, said enhancer comprising at least one of an alkali metal salt; alkali metal aryl salt; ammonium salt; ammonium aryl salt; aryl sulfonic acid; urea; amide; alkylamide; dialkylamide; amide of C1 to C6 alkanoic acids or of C2 to C6 alkandioic acids; diamides of C2 to C6 alkandioic acids; cyclic imide of C2 to C6 alkandioic acids; C3 to C6 lactams, or combinations thereof, is disclosed.