Invention Application
US20070141330A1 Method of producing a semiconductor device, and wafer-processing tape
有权
半导体器件的制造方法以及晶片加工用带
- Patent Title: Method of producing a semiconductor device, and wafer-processing tape
- Patent Title (中): 半导体器件的制造方法以及晶片加工用带
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Application No.: US11700142Application Date: 2007-01-31
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Publication No.: US20070141330A1Publication Date: 2007-06-21
- Inventor: Yasumasa Morishima , Kenji Kita , Shinichi Ishiwata , Takanori Yamakawa
- Applicant: Yasumasa Morishima , Kenji Kita , Shinichi Ishiwata , Takanori Yamakawa
- Assignee: THE FURUKAWA ELECTRIC CO., LTD.
- Current Assignee: THE FURUKAWA ELECTRIC CO., LTD.
- Priority: JP2004-226707 20040803
- Main IPC: B32B37/12
- IPC: B32B37/12 ; B32B38/10 ; B32B38/04 ; B32B7/12 ; B32B15/04

Abstract:
A wafer-processing tape, having a removable adhesive layer(2), and an adhesive layer (3), formed on a substrate film(1), wherein the tape is used in a process involving the steps of: grinding a back face of a wafer circuit substrate (5) having convex-type metal electrodes (4), and dicing the wafer circuit substrate into chips, in a state that the tape is adhered to the wafer circuit substrate; and picking up the chips, in which the chips are picked up in a state that the adhesive layer (3) is peeled from the substrate film (1) but is bonded to the individual chip.
Public/Granted literature
- US08043698B2 Method of producing a semiconductor device, and wafer-processing tape Public/Granted day:2011-10-25
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