发明申请
- 专利标题： Paired pivot arm
- 专利标题（中）： 配对枢轴臂
-
申请号： US11438497申请日： 2006-05-22
-
公开(公告)号： US20070141954A1公开(公告)日： 2007-06-21
- 发明人: Hung Chen , Steven Zuniga
- 申请人： Hung Chen , Steven Zuniga
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： B24B51/00
- IPC分类号： B24B51/00 ; B24B7/30 ; B24B29/00
摘要：
The present invention relates to an apparatus and method for polishing semiconductor substrates. In one embodiment, two polishing heads are mounted on two independent pivoting arms that share one pivot point. Each of the pivoting arms enable the corresponding polishing head direct access to two polishing stations. The polishing system of the present invention provides flexibility and improves throughput.
公开/授权文献
- US07273408B2 Paired pivot arm 公开/授权日：2007-09-25
信息查询
