发明申请
- 专利标题： Method for cleaning a lithographic apparatus module, cleaning arrangement for a lithographic apparatus module and lithographic apparatus comprising the cleaning arrangement
- 专利标题（中）： 用于清洁光刻设备模块的方法，用于光刻设备模块的清洁装置和包括清洁装置的光刻设备
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申请号： US11444535申请日： 2006-06-01
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公开(公告)号： US20070145297A1公开(公告)日： 2007-06-28
- 发明人: Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
- 申请人： Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.
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