发明申请
- 专利标题： Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus
- 专利标题（中）： 光刻设备，设备制造方法和校准光刻设备的方法
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申请号： US11314157申请日： 2005-12-22
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公开(公告)号： US20070146664A1公开(公告)日： 2007-06-28
- 发明人: Koen Jacobus Zaal , Johannes Jacobs , Erik Loopstra , Joost Ottens , Frederik De Jong
- 申请人： Koen Jacobus Zaal , Johannes Jacobs , Erik Loopstra , Joost Ottens , Frederik De Jong
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.
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