发明申请
US20070153408A1 ND FILTER FOR APERTURE DEVICE AND APERTURE DEVICE COMPRISING ND FILTER
有权
用于光纤设备的ND过滤器和包含ND过滤器的光纤设备
- 专利标题: ND FILTER FOR APERTURE DEVICE AND APERTURE DEVICE COMPRISING ND FILTER
- 专利标题(中): 用于光纤设备的ND过滤器和包含ND过滤器的光纤设备
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申请号: US11610741申请日: 2006-12-14
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公开(公告)号: US20070153408A1公开(公告)日: 2007-07-05
- 发明人: Munetoshi YOSHIKAWA , Kazuo Suzuki , Takayuki Wakabayashi , Masayuki Uchiyama
- 申请人: Munetoshi YOSHIKAWA , Kazuo Suzuki , Takayuki Wakabayashi , Masayuki Uchiyama
- 申请人地址: JP Saitama-ken
- 专利权人: CANON DENSHI KABUSHIKI KAISHA
- 当前专利权人: CANON DENSHI KABUSHIKI KAISHA
- 当前专利权人地址: JP Saitama-ken
- 优先权: JP2005-368938 20051222
- 主分类号: G02B5/22
- IPC分类号: G02B5/22
摘要:
This invention decreases deformation of a plastic substrate caused by thermal expansion and contraction in an evaporation process of forming a multi-layered film of an ND filter, thus arising of wrinkles is prevented. The plastic substrate serving as the base of the ND filter is made of a polyimide-based plastic material having a glass transition temperature of 200° C. or more, and has a total transmittance of light of 90% or more and has a haze factor, which represents the haze of 0.5% or less. As the multi-layered film, Al2O3 films for reduction of the reflectance and TiOx films for reduction of the transmittance are alternately formed on the substrate. An MgF2 film made of a low-refraction material is formed as the uppermost layer to further reduce the reflection. In the evaporation process, even when the temperature of the plastic substrate reaches almost 200° C., the sufficiently high glass transition temperature of the plastic material can suppress arising of wrinkles on that portion of the plastic substrate where the multi-layered film is formed.
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