发明申请
US20070154820A1 Photosensitive resin composition and black matrix using the same
审中-公开
感光树脂组合物和黑色矩阵使用相同
- 专利标题: Photosensitive resin composition and black matrix using the same
- 专利标题(中): 感光树脂组合物和黑色矩阵使用相同
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申请号: US11511626申请日: 2006-08-28
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公开(公告)号: US20070154820A1公开(公告)日: 2007-07-05
- 发明人: Hyun Jung Kang , Choun Woo Lee , Hee Young Oh , Cheon Seok Lee
- 申请人: Hyun Jung Kang , Choun Woo Lee , Hee Young Oh , Cheon Seok Lee
- 优先权: KR10-2005-0134886 20051230
- 主分类号: G03F1/00
- IPC分类号: G03F1/00
摘要:
A photosensitive resin composition suitable for the production of a light-shielding black matrix for use in a liquid crystal display is disclosed. The photosensitive resin composition includes a cardo binder resin and a carboxyl group-containing polyfunctional monomer and exhibits superior physical properties, such as heat resistance, chemical resistance, development margin, developability and adhesive properties. Further disclosed is a black matrix produced using the photosensitive resin composition. The black matrix has superior physical properties, including heat resistance, chemical resistance, development margin and adhesive properties. Particularly, since the black matrix has excellent developability with an alkaline solution, it contains no undissolved material of the composition in radiation-unexposed portions.
公开/授权文献
- US1669737A Splint-forming machine 公开/授权日:1928-05-15
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