发明申请
- 专利标题: Process and apparatus for forming pattern
- 专利标题(中): 用于形成图案的工艺和设备
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申请号: US11599941申请日: 2006-11-15
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公开(公告)号: US20070165204A1公开(公告)日: 2007-07-19
- 发明人: Susumu Kibayashi , Hiroaki Satoh , Akira Mihara , Masahiko Fujii
- 申请人: Susumu Kibayashi , Hiroaki Satoh , Akira Mihara , Masahiko Fujii
- 专利权人: Fuji Xerox Co., Ltd.
- 当前专利权人: Fuji Xerox Co., Ltd.
- 优先权: JP2006-009692 20060118
- 主分类号: G03B27/02
- IPC分类号: G03B27/02
摘要:
A pattern forming process and a pattern forming apparatus comprising forming a liquid receptive particle layer on an intermediate transfer body in a specified area by using liquid receptive particles capable of receiving a recording liquid containing a recording material; applying a liquid droplet of the recording liquid on a specified position of liquid receptive particle layer according to specified data, trapping the recording material near the surface of the liquid receptive particle layer on the intermediate transfer body, and forming a pattern of the recording material near the surface of the liquid receptive particle layer; and removing the liquid receptive particle layer provided with the recording liquid from the intermediate transfer body so that the pattern may be positioned between the transfer object and the liquid receptive particle layer, and transferring the liquid receptive particle layer to the transfer object.
公开/授权文献
- US08002400B2 Process and apparatus for forming pattern 公开/授权日:2011-08-23
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