发明申请
- 专利标题: Methods and systems for fabricating semiconductor components with through wire interconnects (TWI)
- 专利标题(中): 通过导线互连(TWI)制造半导体元件的方法和系统
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申请号: US11712815申请日: 2007-03-01
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公开(公告)号: US20070167000A1公开(公告)日: 2007-07-19
- 发明人: Alan Wood , David Hembree
- 申请人: Alan Wood , David Hembree
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763
摘要:
A semiconductor component includes a semiconductor substrate having a substrate contact, and a through wire interconnect (TWI) bonded to the substrate contact. The through wire interconnect (TWI) includes a via through the substrate contact and the substrate, a wire in the via bonded to the substrate contact, and a contact on the wire. A stacked semiconductor component includes the semiconductor substrate, and a second semiconductor substrate stacked on the substrate and bonded to a through wire interconnect on the substrate. A method for fabricating a semiconductor component with a through wire interconnect includes the steps of providing a semiconductor substrate with a substrate contact, forming a via through the substrate contact and part way through the substrate, placing the wire in the via, bonding the wire to the substrate contact, and then thinning the substrate from a second side to expose a contact on the wire. A system for fabricating the semiconductor component includes a bonding capillary configured to place the wire in the via, and to form a bonded connection between the wire and the substrate contact.
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