发明申请
- 专利标题: Mask for exposure
- 专利标题(中): 面具曝光
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申请号: US11728382申请日: 2007-03-26
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公开(公告)号: US20070169958A1公开(公告)日: 2007-07-26
- 发明人: Yutaka Kaneda
- 申请人: Yutaka Kaneda
- 申请人地址: JP Tokyo
- 专利权人: Sony Chemical & Information Device Corporation
- 当前专利权人: Sony Chemical & Information Device Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JPJP2000-388816 20001221
- 主分类号: H05K1/00
- IPC分类号: H05K1/00
摘要:
In one embodiment, the present invention provides a process for manufacturing a multilayer flexible wiring board, which allows individual layers of wiring boards to be precisely positioned and to be readily stacked. A mask for exposure is prepared in which a plurality of pattern holes corresponding to individual layers of wiring boards of a multilayer flexible wiring board are arranged in the direction perpendicular to the transporting direction P of substrate. This mask for exposure is used to form a plurality of wiring patterns corresponding to individual layers of wiring boards of a multilayer flexible wiring board on the same sheet-like substrate.
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