发明申请
- 专利标题: Patterned medium and method of manufacturing the same
- 专利标题(中): 图案化介质及其制造方法
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申请号: US11652586申请日: 2007-01-12
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公开(公告)号: US20070172704A1公开(公告)日: 2007-07-26
- 发明人: Byung-kyu Lee , No-yeol Park , Jin-seung Sohn , Seong-yong Yoon
- 申请人: Byung-kyu Lee , No-yeol Park , Jin-seung Sohn , Seong-yong Yoon
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2006-0008244 20060126
- 主分类号: H05K3/00
- IPC分类号: H05K3/00 ; G11B5/64
摘要:
A patterned medium and a method of manufacturing the same are provided. The patterned medium includes a data region having a plurality of recording dots arrayed along a plurality of tracks; and a non-data region comprising a part of the patterned medium other than the data region, the non-data region having a plurality of pattern marks. The method includes depositing an aluminum layer on a base substrate; depositing a photo-resist on the aluminum layer; forming a pattern on the photo-resist using a lithography process; forming a fine pattern by forming a plurality of cavities on a portion of the aluminum layer which is exposed through the photo-resist; removing the photo-resist; forming a mold pattern; imprinting the mold pattern on a media substrate to form cavities on the media substrate; and filling the cavities with a recording material.
公开/授权文献
- US07754354B2 Patterned medium and method of manufacturing the same 公开/授权日:2010-07-13
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