发明申请
US20070172704A1 Patterned medium and method of manufacturing the same 有权
图案化介质及其制造方法

Patterned medium and method of manufacturing the same
摘要:
A patterned medium and a method of manufacturing the same are provided. The patterned medium includes a data region having a plurality of recording dots arrayed along a plurality of tracks; and a non-data region comprising a part of the patterned medium other than the data region, the non-data region having a plurality of pattern marks. The method includes depositing an aluminum layer on a base substrate; depositing a photo-resist on the aluminum layer; forming a pattern on the photo-resist using a lithography process; forming a fine pattern by forming a plurality of cavities on a portion of the aluminum layer which is exposed through the photo-resist; removing the photo-resist; forming a mold pattern; imprinting the mold pattern on a media substrate to form cavities on the media substrate; and filling the cavities with a recording material.
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