发明申请
US20070172998A1 THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND LIQUID CRYSTAL DISPLAY HAVING THE SAME
有权
薄膜晶体管基板,其制造方法和具有该薄膜晶体管的液晶显示器
- 专利标题: THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND LIQUID CRYSTAL DISPLAY HAVING THE SAME
- 专利标题(中): 薄膜晶体管基板,其制造方法和具有该薄膜晶体管的液晶显示器
-
申请号: US11610231申请日: 2006-12-13
-
公开(公告)号: US20070172998A1公开(公告)日: 2007-07-26
- 发明人: Jong Hyuk LEE
- 申请人: Jong Hyuk LEE
- 申请人地址: KR Suwon-Si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD
- 当前专利权人地址: KR Suwon-Si
- 优先权: KR10-2006-0007389 20060124
- 主分类号: H01L21/84
- IPC分类号: H01L21/84
摘要:
A thin film transistor substrate and method of manufacturing a thin film transistor substrate through a 3-sheet mask process includes forming a first conductive film on a substrate; forming a gate line including a gate electrode using a first photoresist film pattern formed on the first conductive film through a first mask with a desired pattern formed thereon; sequentially forming a gate insulation film, an active layer, an ohmic contact layer, a second conductive film and a protection film on an entire surface of the substrate; forming an active region and a data line including source-drain electrodes using a second photoresist film pattern that has different thicknesses in predetermined regions and is formed on the protection film through a second mask with a desired pattern formed thereon; forming a contact hole by exposing a channel region of the active layer and partially exposing the source-drain electrodes using the second photoresist pattern; forming a third conductive film on the entire surface of the substrate; and forming a pixel electrode to be connected to the contact hole using a third photoresist film pattern formed on the third conductive film through a third mask with a desired pattern formed thereon. The present invention further provides a liquid crystal display having the same.
公开/授权文献
信息查询
IPC分类: