发明申请
US20070172998A1 THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND LIQUID CRYSTAL DISPLAY HAVING THE SAME 有权
薄膜晶体管基板,其制造方法和具有该薄膜晶体管的液晶显示器

  • 专利标题: THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND LIQUID CRYSTAL DISPLAY HAVING THE SAME
  • 专利标题(中): 薄膜晶体管基板,其制造方法和具有该薄膜晶体管的液晶显示器
  • 申请号: US11610231
    申请日: 2006-12-13
  • 公开(公告)号: US20070172998A1
    公开(公告)日: 2007-07-26
  • 发明人: Jong Hyuk LEE
  • 申请人: Jong Hyuk LEE
  • 申请人地址: KR Suwon-Si
  • 专利权人: SAMSUNG ELECTRONICS CO., LTD
  • 当前专利权人: SAMSUNG ELECTRONICS CO., LTD
  • 当前专利权人地址: KR Suwon-Si
  • 优先权: KR10-2006-0007389 20060124
  • 主分类号: H01L21/84
  • IPC分类号: H01L21/84
THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND LIQUID CRYSTAL DISPLAY HAVING THE SAME
摘要:
A thin film transistor substrate and method of manufacturing a thin film transistor substrate through a 3-sheet mask process includes forming a first conductive film on a substrate; forming a gate line including a gate electrode using a first photoresist film pattern formed on the first conductive film through a first mask with a desired pattern formed thereon; sequentially forming a gate insulation film, an active layer, an ohmic contact layer, a second conductive film and a protection film on an entire surface of the substrate; forming an active region and a data line including source-drain electrodes using a second photoresist film pattern that has different thicknesses in predetermined regions and is formed on the protection film through a second mask with a desired pattern formed thereon; forming a contact hole by exposing a channel region of the active layer and partially exposing the source-drain electrodes using the second photoresist pattern; forming a third conductive film on the entire surface of the substrate; and forming a pixel electrode to be connected to the contact hole using a third photoresist film pattern formed on the third conductive film through a third mask with a desired pattern formed thereon. The present invention further provides a liquid crystal display having the same.
信息查询
IPC分类:
H 电学
H01 基本电气元件
H01L 半导体器件;其他类目中不包括的电固体器件(使用半导体器件的测量入G01;一般电阻器入H01C;磁体、电感器、变压器入H01F;一般电容器入H01G;电解型器件入H01G9/00;电池组、蓄电池入H01M;波导管、谐振器或波导型线路入H01P;线路连接器、汇流器入H01R;受激发射器件入H01S;机电谐振器入H03H;扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R;一般电光源入H05B;印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K;在具有特殊应用的电路中使用的半导体器件见应用相关的小类)
H01L21/00 专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/70 .由在一共用基片内或其上形成的多个固态组件或集成电路组成的器件或其部件的制造或处理;集成电路器件或其特殊部件的制造(由预制电组件组成的组装件的制造入H05K3/00,H05K13/00)
H01L21/77 ..在公共衬底中或上面形成的由许多固态元件或集成电路组成的器件的制造或处理(电可编程只读存储器或其多步骤的制造方法入H01L27/115)
H01L21/78 ...把衬底连续地分成多个独立的器件(改变表面物理特性或者半导体形状的切割入H01L21/304)
H01L21/82 ....制造器件,例如每一个由许多元件组成的集成电路
H01L21/84 .....衬底不是半导体的,例如绝缘体
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