发明申请
- 专利标题: Method for replenishing a source gas in a cavitation medium
- 专利标题(中): 在空化介质中补充源气体的方法
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申请号: US11215899申请日: 2005-08-31
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公开(公告)号: US20070175525A1公开(公告)日: 2007-08-02
- 发明人: Ross Tessien
- 申请人: Ross Tessien
- 申请人地址: US CA Grass Valley
- 专利权人: Impulse Devices, Inc.
- 当前专利权人: Impulse Devices, Inc.
- 当前专利权人地址: US CA Grass Valley
- 主分类号: F17D1/00
- IPC分类号: F17D1/00
摘要:
A method of replenishing reactant-depleted cavitation medium within a cavitation chamber without re-pressurizing the entire cavitation system is provided, reactant depletion resulting from the cavitation process performed within the cavitation chamber. In addition to the cavitation chamber, the cavitation system includes a cavitation medium reservoir flexibly coupled to the chamber via a pair of conduits. The flexible couplings allow the relative positions of the cavitation chamber and the cavitation medium reservoir to be varied, thereby providing a means of either forcing the cavitation fluid to flow from the chamber and into the reservoir or from the reservoir and into the chamber. Such fluid flow causes mixing of the cavitation medium contained within the chamber and that contained within the reservoir, thus allowing replenishment of the source, e.g., reactant, within the chamber by mixing the cavitation fluid contained therein with non-depleted fluid contained within the reservoir. Additionally, inducing cavitation fluid mixing by altering the relative positions of the chamber and the reservoir can be used as an aid to degassing.
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