发明申请
- 专利标题: IMAGING APPARATUS, RADIATION IMAGING APPARATUS, AND MANUFACTURING METHODS THEREFOR
- 专利标题(中): 成像装置,放射成像装置及其制造方法
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申请号: US11625412申请日: 2007-01-22
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公开(公告)号: US20070176216A1公开(公告)日: 2007-08-02
- 发明人: Minoru Watanabe , Chiori Mochizuki , Takamasa Ishii
- 申请人: Minoru Watanabe , Chiori Mochizuki , Takamasa Ishii
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-020979 20060130
- 主分类号: H01L31/113
- IPC分类号: H01L31/113
摘要:
An imaging apparatus is provided in which a plurality of pixels, each having a conversion element and a thin-film transistor, are arranged in a two-dimensional fashion on an insulating substrate; the photoelectric conversion element is arranged over the thin-film transistor, with an insulating film, which serves as an interlayer insulating film, inserted between the conversion element and the thin-film transistor; and by way of a contact hole portion provided in the insulating film, the source electrode or the drain electrode of the thin-film transistor and the photoelectric conversion element are connected with each other. The imaging apparatus has a pixel in which the contact hole portion is removed through a laser-beam irradiation so that the connection portion between the conversion element and a conductive layer, which serves as the source electrode or the drain electrode of the thin-film transistor, is discontinued.
公开/授权文献
- US07468531B2 Imaging apparatus and radiation imaging apparatus 公开/授权日:2008-12-23
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