发明申请
- 专利标题： Thin film-forming material and method for producing thin film
- 专利标题（中）： 薄膜形成材料和薄膜的制造方法
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申请号： US11628850申请日： 2005-05-31
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公开(公告)号： US20070178235A1公开(公告)日： 2007-08-02
- 发明人: Naoki Yamada , Shinichi Tanaka
- 申请人： Naoki Yamada , Shinichi Tanaka
- 申请人地址： JP ARAKAWA-KU TOKYO JAPAN 116-8554
- 专利权人： ADEKA CORPORATION
- 当前专利权人： ADEKA CORPORATION
- 当前专利权人地址： JP ARAKAWA-KU TOKYO JAPAN 116-8554
- 优先权： JP2004-175122 20040614
- 国际申请： PCT/JP05/09932 WO 20050531
- 主分类号： C23C16/06
- IPC分类号： C23C16/06 ; C07F3/06
摘要：
The thin film-forming material of the present invention comprises a bis(β-diketonato)zinc compound that is liquid at 25° C. and is suitable for forming a zinc-containing thin film. By using the thin film-forming material, a thin film can be produced with stable film-forming rate or stable film composition control without suffering from problems of raw material gas suppliability and in-line raw material transport. Preferred (β-diketonato)zinc compounds include, for example, bis(octane-2,4-dionato)zinc and bis(2,2-dimethyl-6-ethyldecane-3,5-dionato)zinc.