发明申请
- 专利标题： Stress and strain analysis method and its equipment
- 专利标题（中）： 应力和应变分析方法及其设备
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申请号： US11655219申请日： 2007-01-19
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公开(公告)号： US20070186674A1公开(公告)日： 2007-08-16
- 发明人: Koji Hyodo , Chao-Nan Xu , Takashi Yamane , Motoyuki Akamatsu , Yoshiyuki Yokogawa , Tetsuya Kameyama
- 申请人： Koji Hyodo , Chao-Nan Xu , Takashi Yamane , Motoyuki Akamatsu , Yoshiyuki Yokogawa , Tetsuya Kameyama
- 申请人地址： JP Tokyo
- 专利权人： NATIONAL INSTITUTE OF ADVANCED INDUSTRIALS SCIENCE AND TECHNOLOGY
- 当前专利权人： NATIONAL INSTITUTE OF ADVANCED INDUSTRIALS SCIENCE AND TECHNOLOGY
- 当前专利权人地址： JP Tokyo
- 优先权： JP2006-011844 20060120
- 主分类号： G01N3/08
- IPC分类号： G01N3/08
摘要：
Provided are a stress analysis method and stress analysis equipment that enable a detailed stress measurement, by using both a photoelasticity measurement method and a stress measurement (mechanoluminescence measurement) which utilizes a mechanoluminescent substance to measure a stress state of an object. Physical quantities that are measurable include individual principal stress component and a principal stress direction. The photoelasticity measurement method alone cannot measure individual principal stress component values.
公开/授权文献
- US07509872B2 Stress and strain analysis method and its equipment 公开/授权日：2009-03-31
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