Invention Application
- Patent Title: Method of processing on-press developable lithographic printing plate
- Patent Title (中): 加工可印刷平版印刷版的方法
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Application No.: US11356911Application Date: 2006-02-18
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Publication No.: US20070193460A1Publication Date: 2007-08-23
- Inventor: Gary Teng
- Applicant: Gary Teng
- Main IPC: B41N1/00
- IPC: B41N1/00

Abstract:
A method of deactivating and on-press developing an exposed lithographic printing plate is disclosed. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is exposed with the radiation, deactivated, and then on-press developed with ink and/or fountain solution. The deactivation of the exposed plate allows the handling of the plate under regular office light or any other light without causing the hardening of the non-exposed areas of the photosensitive layer.
Public/Granted literature
- US07358034B2 Method of processing on-press developable lithographic printing plate Public/Granted day:2008-04-15
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