发明申请
US20070197840A1 Halogenated compositions 审中-公开
卤化组合物

Halogenated compositions
摘要:
Compositions are provided that can include RF(RT)nQ, The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.
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