发明申请
US20070200069A1 Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System 有权
用于带电粒子束系统的双级带电粒子束能量减少系统

  • 专利标题: Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System
  • 专利标题(中): 用于带电粒子束系统的双级带电粒子束能量减少系统
  • 申请号: US10571347
    申请日: 2004-09-02
  • 公开(公告)号: US20070200069A1
    公开(公告)日: 2007-08-30
  • 发明人: Jürgen FrosienRalf DegenhardtStefan Lanio
  • 申请人: Jürgen FrosienRalf DegenhardtStefan Lanio
  • 优先权: EP03020711.2 20030911; EP03020710.4 20030911; EP03028696.7 20031216
  • 国际申请: PCT/EP04/09801 WO 20040902
  • 主分类号: G21K1/08
  • IPC分类号: G21K1/08
Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System
摘要:
The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
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