发明申请
US20070202619A1 Laser processing apparatus and laser processing method 有权
激光加工设备和激光加工方法

  • 专利标题: Laser processing apparatus and laser processing method
  • 专利标题(中): 激光加工设备和激光加工方法
  • 申请号: US11598653
    申请日: 2006-11-14
  • 公开(公告)号: US20070202619A1
    公开(公告)日: 2007-08-30
  • 发明人: Muneo TamuraTetsuo Fujii
  • 申请人: Muneo TamuraTetsuo Fujii
  • 申请人地址: JP Kariya-city
  • 专利权人: DENSO CORPORATION
  • 当前专利权人: DENSO CORPORATION
  • 当前专利权人地址: JP Kariya-city
  • 优先权: JP2005-331222 20051116; JP2005-331220 20051116
  • 主分类号: H01L21/00
  • IPC分类号: H01L21/00
Laser processing apparatus and laser processing method
摘要:
A laser processing apparatus has one laser light source that simultaneously radiates laser beams with two wavelengths. Depth positions of focusing points for laser beams are gradually changed in a wafer. Three sets of modifying region groups, i.e., six layers of modifying region groups, are successively formed. One set of modifying region groups constitutes two layers and is formed at a time. The modifying region groups are separated, adjoined, or overlapped with each other along an estimated cut line of the wafer in a depth direction from a surface thereof.
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