发明申请
US20070204420A1 Polishing pad and method of making 审中-公开
抛光垫和制作方法

Polishing pad and method of making
摘要:
A buffing pad. The buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween. A method of making the buffing pad is also disclosed.
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