- 专利标题: Structures and methods for enhancing capacitors in integrated circuits
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申请号: US11796773申请日: 2007-04-30
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公开(公告)号: US20070207588A1公开(公告)日: 2007-09-06
- 发明人: Cem Basceri , Vishnu Agarwal , Dan Gealy
- 申请人: Cem Basceri , Vishnu Agarwal , Dan Gealy
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 主分类号: H01L21/328
- IPC分类号: H01L21/328 ; H01L21/20
摘要:
Systems, devices, structures, and methods are described that inhibit dielectric degradation at high temperatures. An enhanced capacitor is discussed. The enhanced capacitor includes a first electrode, a dielectric that includes ditantalum pentaoxide, and a second electrode having a compound. The compound includes a first substance and a second substance. The second electrode includes a trace amount of the first substance. The morphology of the semiconductor structure remains stable when the trace amount of the first substance is oxidized during crystallization of the dielectric. In one embodiment, the crystalline structure of the dielectric describes substantially a (001) lattice plane.
公开/授权文献
- US07390712B2 Methods of enhancing capacitors in integrated circuits 公开/授权日:2008-06-24
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