发明申请
- 专利标题: Gallium nitride crystal and method of making same
- 专利标题(中): 氮化镓晶体及其制造方法
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申请号: US11588181申请日: 2006-10-26
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公开(公告)号: US20070215887A1公开(公告)日: 2007-09-20
- 发明人: Mark Philip D'Evelyn , Dong-Sil Park , Steven Francis LeBoeuf , Larry Burton Rowland , Kristi Jean Narang , Huicong Hong , Peter Micah Sandvik
- 申请人: Mark Philip D'Evelyn , Dong-Sil Park , Steven Francis LeBoeuf , Larry Burton Rowland , Kristi Jean Narang , Huicong Hong , Peter Micah Sandvik
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
There is provided a GaN single crystal at least about 2.75 millimeters in diameter, with a dislocation density less than about 104 cm−1, and having substantially no tilt boundaries. A method of forming a GaN single crystal is also disclosed. The method includes providing a nucleation center, a GaN source material, and a GaN solvent in a chamber. The chamber is pressurized. First and second temperature distributions are generated in the chamber such that the solvent is supersaturated in the nucleation region of the chamber. The first and second temperature distributions have different temperature gradients within the chamber.
公开/授权文献
- US08357945B2 Gallium nitride crystal and method of making same 公开/授权日:2013-01-22
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