Invention Application
- Patent Title: Device having a contacting structure
- Patent Title (中): 具有接触结构的装置
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Application No.: US11728900Application Date: 2007-03-27
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Publication No.: US20070216025A1Publication Date: 2007-09-20
- Inventor: Norbert Seliger , Karl Weidner , Jorg Zapf
- Applicant: Norbert Seliger , Karl Weidner , Jorg Zapf
- Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee: SIEMENS AKTIENGESELLSCHAFT
- Priority: DE10308978.0 20030228; EPPCT/EP04/00629 20040126
- Main IPC: H01L23/485
- IPC: H01L23/485

Abstract:
A layer of electrically insulating material is applied to a substrate and a component located thereon, in such a way that said layer follows the surface contours.
Public/Granted literature
- US07855451B2 Device having a contacting structure Public/Granted day:2010-12-21
Information query
IPC分类: