- 专利标题: Inductor and method of forming the same
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申请号: US11804320申请日: 2007-05-17
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公开(公告)号: US20070216510A1公开(公告)日: 2007-09-20
- 发明人: Joo-Hyun Jeong , Chul-Ho Chung
- 申请人: Joo-Hyun Jeong , Chul-Ho Chung
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2005-0000277 20050103
- 主分类号: H01F5/00
- IPC分类号: H01F5/00
摘要:
An inductor pattern is formed on a substrate. A conductive pattern having a concave-convex structure is formed on the inductor pattern to increase a surface area of the inductor pattern. An insulation layer is formed on the inductor pattern. After a groove is formed such that the insulation layer is removed to expose the inductor pattern, a conductive pattern is conformally formed on the groove and the insulation layer. Thus, a surface area of the inductor pattern as well as a thickness of an inductor increases to obtain an inductor of a high quality factor.
公开/授权文献
- US07405643B2 Inductor and method of forming the same 公开/授权日:2008-07-29
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