Invention Application
US20070216990A1 Optical Element And Method For Forming Domain Inversion Regions
有权
用于形成域反转区域的光学元件和方法
- Patent Title: Optical Element And Method For Forming Domain Inversion Regions
- Patent Title (中): 用于形成域反转区域的光学元件和方法
-
Application No.: US10593866Application Date: 2005-03-15
-
Publication No.: US20070216990A1Publication Date: 2007-09-20
- Inventor: Akihiro Morikawa , Tomoya Sugita , Kiminori Mizuuchi
- Applicant: Akihiro Morikawa , Tomoya Sugita , Kiminori Mizuuchi
- Priority: JP2004-086230 20040324
- International Application: PCT/JP05/04520 WO 20050315
- Main IPC: G02F1/00
- IPC: G02F1/00
Abstract:
There is provided a stable optical element having a fine, uniform, and wide-ranging domain inversion structure in a ferroelectric crystal. This includes a plurality of domain inversions (101) formed on an MgO:LiNbO3 substrate (100), and a groove (102) formed on the substrate surface between the domain inversions (101). The depth T′ of substantially all of the domain inversions (101) satisfies the relation T′
Public/Granted literature
- US07440161B2 Optical element and method for forming domain inversion regions Public/Granted day:2008-10-21
Information query
