发明申请
- 专利标题： Cell Culture Patterning Substrate And Method For Manufacturing The Same
- 专利标题（中）： 细胞培养图案基质及其制造方法
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申请号： US11587363申请日： 2005-04-25
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公开(公告)号： US20070218554A1公开(公告)日： 2007-09-20
- 发明人: Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi
- 申请人： Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi
- 申请人地址： JP Tokyo-To
- 专利权人： DAI NIPPON PRINTING CO., LTD.
- 当前专利权人： DAI NIPPON PRINTING CO., LTD.
- 当前专利权人地址： JP Tokyo-To
- 优先权： JP2004-129721 20040426
- 国际申请： PCT/JP05/07775 WO 20050425
- 主分类号： C12N5/02
- IPC分类号： C12N5/02
摘要：
A main object of the present invention is to provide a cell culture patterning substrate and a method for manufacturing the same, which can be used to culture the cells on the substrate in an intended shape. To achieve the object, the present invention provides a cell culture patterning substrate comprising: a base material provided with a convex portion; and a cell culture region, which is a region for culturing a cell, formed on a surface of the base material, wherein the cell culture region is partitioned with the convex portion of the base material provided with the convex portion.
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