发明申请
US20070222957A1 Exposure apparatus, exposure method, and method for producing device
有权
曝光装置，曝光方法和制造装置的方法
- 专利标题： Exposure apparatus, exposure method, and method for producing device
- 专利标题（中）： 曝光装置，曝光方法和制造装置的方法
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申请号： US11802060申请日： 2007-05-18
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公开(公告)号： US20070222957A1公开(公告)日： 2007-09-27
- 发明人: Hiroyuki Nagasaka , Takeshi Okuyama
- 申请人： Hiroyuki Nagasaka , Takeshi Okuyama
- 申请人地址： JP TOKYO JP YOKOHAMA-SHI
- 专利权人： NIKON CORPORATION,NIKON ENGINEERING CO., LTD.
- 当前专利权人： NIKON CORPORATION,NIKON ENGINEERING CO., LTD.
- 当前专利权人地址： JP TOKYO JP YOKOHAMA-SHI
- 优先权： JP2004-172569 20040610; JP2004-245260 20040825; JP2004-330582 20041115
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
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