Invention Application
- Patent Title: Reflective photomask, method of fabricating the same, and reflective blank photomask
- Patent Title (中): 反射光掩模，其制造方法和反射性空白光掩模
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Application No.: US11723472Application Date: 2007-03-20
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Publication No.: US20070224523A1Publication Date: 2007-09-27
- Inventor: Sung-min Huh , Hee-bom Kim
- Applicant: Sung-min Huh , Hee-bom Kim
- Assignee: SAMSUNG ELECTRONICS CO., LTD
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD
- Priority: KR10-2006-0025811 20060321
- Main IPC: B32B9/00
- IPC: B32B9/00 ; B32B17/06 ; B32B17/10 ; G03F1/00 ; G21K5/00
Abstract:
The reflective photomask may include a substrate, a reflective layer formed on the substrate, an absorption pattern formed on the reflective layer and over a first portion of the substrate. A compensatory portion may be formed over at least a second portion of the substrate. The second portion is adjacent to the first portion, and the compensatory portion is thinner than the absorption pattern.
Public/Granted literature
- US07642017B2 Reflective photomask, method of fabricating the same, and reflective blank photomask Public/Granted day:2010-01-05
Information query
