发明申请
- 专利标题: Immersion Lithography Fluids
- 专利标题(中): 浸没光刻液
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申请号: US11754725申请日: 2007-05-29
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公开(公告)号: US20070229795A1公开(公告)日: 2007-10-04
- 发明人: Peng Zhang , Bridgette Budhlall , Gene Parris , Leslie Barber
- 申请人: Peng Zhang , Bridgette Budhlall , Gene Parris , Leslie Barber
- 申请人地址: US PA Allentown 18195-1501
- 专利权人: AIR PRODUCTS AND CHEMICALS, INC.
- 当前专利权人: AIR PRODUCTS AND CHEMICALS, INC.
- 当前专利权人地址: US PA Allentown 18195-1501
- 主分类号: G03B27/32
- IPC分类号: G03B27/32 ; G03B11/00
摘要:
Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 365 nm are disclosed herein.
公开/授权文献
- US08007986B2 Immersion lithography fluids 公开/授权日:2011-08-30
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