Invention Application
- Patent Title: Enhanced Multi Channel Alignment
- Patent Title (中): 增强多通道对齐
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Application No.: US11694644Application Date: 2007-03-30
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Publication No.: US20070231421A1Publication Date: 2007-10-04
- Inventor: Pawan Kumar Nimmakayala , Byung-Jin Choi , Tom H. Rafferty , Philip D. Schumaker
- Applicant: Pawan Kumar Nimmakayala , Byung-Jin Choi , Tom H. Rafferty , Philip D. Schumaker
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Main IPC: B29C35/08
- IPC: B29C35/08
Abstract:
A imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.
Information query
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