发明申请
US20070231954A1 Gold/silicon eutectic die bonding method 审中-公开
金/硅共晶晶片接合法

  • 专利标题: Gold/silicon eutectic die bonding method
  • 专利标题(中): 金/硅共晶晶片接合法
  • 申请号: US11396404
    申请日: 2006-03-31
  • 公开(公告)号: US20070231954A1
    公开(公告)日: 2007-10-04
  • 发明人: Kai LiuMing Sun
  • 申请人: Kai LiuMing Sun
  • 主分类号: H01L21/00
  • IPC分类号: H01L21/00
Gold/silicon eutectic die bonding method
摘要:
A gold/silicon eutectic die bonding method is disclosed. The method includes the steps of 1) vacuum evaporating a layer of titanium to a silicon wafer backside, the titanium layer having a thickness less than 200 Å, 2) immediately vacuum evaporating a layer of gold onto the titanium layer, the gold layer having a thickness in the range of 0.5 to 1.5 microns, 3) dicing the wafer, and 4) mounting the die onto a substrate at a eutectic temperature to form a gold/silicon eutectic alloy bond.
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