发明申请
- 专利标题： Capacitor Electrodes Produced with Atomic Layer Deposition for Use in Implantable Medical Devices
- 专利标题（中）： 用于植入式医疗器械的原子层沉积产生的电容器电极
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申请号： US11278307申请日： 2006-03-31
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公开(公告)号： US20070236867A1公开(公告)日： 2007-10-11
- 发明人: Joachim Hossick-Schott , Naim Istephanous , John Norton , Anthony Rorvick , Richard Francis
- 申请人： Joachim Hossick-Schott , Naim Istephanous , John Norton , Anthony Rorvick , Richard Francis
- 主分类号： H01G9/00
- IPC分类号： H01G9/00
摘要：
An electrolytic capacitor cell for use in implantable medical devices and associated method for manufacture are provided. The capacitor cell includes an electrode substrate having a dielectric layer formed thereon by atomic layer deposition. In various embodiments, the dielectric layer includes an oxide of one or more valve metals.
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