发明申请
US20070238185A1 Oxide Layers on Silicon Substrates for Effective Confocal Laser Microscopy
有权
硅衬底上的氧化物层用于有效的共焦激光显微镜
- 专利标题: Oxide Layers on Silicon Substrates for Effective Confocal Laser Microscopy
- 专利标题(中): 硅衬底上的氧化物层用于有效的共焦激光显微镜
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申请号: US11614896申请日: 2006-12-21
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公开(公告)号: US20070238185A1公开(公告)日: 2007-10-11
- 发明人: Robert Kuimelis , Zihui Chen , Glenn McGall
- 申请人: Robert Kuimelis , Zihui Chen , Glenn McGall
- 申请人地址: US CA Santa Clara
- 专利权人: Affymetrix, INC.
- 当前专利权人: Affymetrix, INC.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: G01N21/76
- IPC分类号: G01N21/76 ; G01N33/00 ; G01N33/48
摘要:
Methods of performing confocal laser microscopy on a polymer array disposed on a silicon wafer substrate, the method comprising the steps of providing a silicon wafer substrate having a top side and a bottom side, coating the top side of the silicon wafer with an oxide coating to provide an oxide coated wafer, covalently coupling a plurality of probes to the top side of the coated wafer to provide a fixed polymer array, hybridizing the fixed polymer array with a plurality of labeled ligands, and assaying for one or more hybridized ligands using confocal laser fluorescence microscopy to detect hybridization are provided.
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