发明申请
- 专利标题: Process for producing metal oxide flakes
- 专利标题(中): 生产金属氧化物薄片的方法
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申请号: US11732405申请日: 2007-04-03
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公开(公告)号: US20070243337A1公开(公告)日: 2007-10-18
- 发明人: Rong Xiong , Patrice Bujard
- 申请人: Rong Xiong , Patrice Bujard
- 主分类号: B05D1/36
- IPC分类号: B05D1/36 ; C08J7/18
摘要:
The present invention relates to a process for the preparation of a plane-parallel structure (a platelet-shaped body, or flake), comprising at least one dielectric layer consisting of oxides of one or more metal selected from groups 3 to 15 of the periodic table, which method comprises: (a) optionally applying a layer of release material on a substrate, (b) applying a composition comprising one or more precursors of one or more desired metal oxides to said release layer, or directly to a substrate with no layer of release material, (c) subjecting the one or more precursors of one or more desired metal oxides to microwave radiation to form a metal oxide layer on the substrate or on the layer of release material; and (d) separating the resulting metal oxide layer from the substrate as plane-parallel structures.
公开/授权文献
- US07901609B2 Process for producing metal oxide flakes 公开/授权日:2011-03-08
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