This invention pertains to a method for cleaning an automatic process device. The device is an apparatus for thermally treating a photosensitive element to form a relief surface. One or more contactable surfaces in the device can become contaminated with residue or other materials deposited from the photosensitive element during thermal treating and/or foreign bodies from ambient environment. A cleaning element having an adhesive layer on a support removes or reduces the level of contaminants on the contactable surface. The method includes passing the cleaning element through the device so that the adhesive layer contacts the contactable surfaces and thereby transfers at least one of the contaminants to the adhesive layer.