发明申请
US20070249141A1 Method of manufacturing electrode pattern 审中-公开
制作电极图案的方法

  • 专利标题: Method of manufacturing electrode pattern
  • 专利标题(中): 制作电极图案的方法
  • 申请号: US11785578
    申请日: 2007-04-18
  • 公开(公告)号: US20070249141A1
    公开(公告)日: 2007-10-25
  • 发明人: Young LeeJeong ChoHang Cho
  • 申请人: Young LeeJeong ChoHang Cho
  • 优先权: KR10-2006-0035143 20060418
  • 主分类号: H01L21/00
  • IPC分类号: H01L21/00 H01L21/30
Method of manufacturing electrode pattern
摘要:
A method of manufacturing an electrode pattern comprises preparing a first support film; forming a mold release pattern on one surface of the first support film, the mold release pattern defining an internal electrode formation region; forming an electrode layer on the mold release pattern by using a thin film technique; preparing a second support film; forming a transfer target layer on one surface of the second support film; disposing the electrode layer of the first support film and the transfer target layer of the second support film such that the electrode layer and the transfer target layer face each other; thermally compression-bonding the first and second films disposed to face each other such that the electrode layer positioned on the mold release pattern is transferred onto the transfer target layer; and separating the first and second films from each other.
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