发明申请
US20070252882A1 PATTERN FORMING METHOD, DROPLET DISCHARGING DEVICE AND CIRCUIT MODULE
失效
图案形成方法，放电放电装置和电路模块
- 专利标题： PATTERN FORMING METHOD, DROPLET DISCHARGING DEVICE AND CIRCUIT MODULE
- 专利标题（中）： 图案形成方法，放电放电装置和电路模块
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申请号： US11739623申请日： 2007-04-24
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公开(公告)号： US20070252882A1公开(公告)日： 2007-11-01
- 发明人: Hirotsuna Miura
- 申请人： Hirotsuna Miura
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2006-124095 20060427; JP2007-032513 20070213
- 主分类号： B41J2/01
- IPC分类号： B41J2/01
摘要：
A method of forming a pattern including: discharging a droplet of a pattern forming material onto a substrate; drying the droplet that has landed on the substrate; and forming a pattern on the substrate, the drying comprising: irradiating a region of the droplet with a laser beam launched by a laser source; and reflectively irradiating the region of the droplet again with the portions of the laser beam that have been either reflected or scattered from the region of the droplet.
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