- 专利标题: Lithographic apparatus and device manufacturing method
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申请号: US11703823申请日: 2007-02-08
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公开(公告)号: US20070252967A1公开(公告)日: 2007-11-01
- 发明人: Arno Bleeker , Kars Troost
- 申请人: Arno Bleeker , Kars Troost
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/54
- IPC分类号: G03B27/54
摘要:
Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.
公开/授权文献
- US07965380B2 Lithographic apparatus and device manufacturing method 公开/授权日:2011-06-21
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