发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
- 专利标题(中): 半导体器件及其制造方法
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申请号: US11779801申请日: 2007-07-18
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公开(公告)号: US20070257346A1公开(公告)日: 2007-11-08
- 发明人: Yoshiyuki Tanigawa , Tamaki Wada
- 申请人: Yoshiyuki Tanigawa , Tamaki Wada
- 优先权: JP2004-316026 20041029
- 主分类号: H01L23/02
- IPC分类号: H01L23/02
摘要:
A process yield of a semiconductor device is enhanced. To that end, there is provided a semiconductor device comprising a substrate having a component mount face with semiconductor chips mounted thereon, the substrate being provided with a plurality of connection leads, and a cap made of resin, placed over the component mount face of the substrate so as to cover the same, the a cap having a first body part, and a second body part larger in thickness than the first body part. Because product information in the form of inscriptions is engraved on the top surface side of the second body part of the cap, the product information can be displayed without the use of an ink mark, it is possible to prevent occurrence of marking defects due to ink bleed, and so forth, thereby enhancing the process yield of a memory card (the semiconductor device).
公开/授权文献
- US07656014B2 Semiconductor device and method for manufacturing same 公开/授权日:2010-02-02
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