The invention relates to a method for the production of a thin dense ceramic layer on a substrate by means of atmospheric plasma spraying, whereby the following steps are carried out: a) the substrate is pre-heated to a temperature corresponding to at least a quarter of the melting point of the ceramic for application in Kelvin, b) a ceramic powder or a ceramic powder mixture with d50-values of less than 50 gm is used as spray adjunct, c) particle speeds at incidence on the substrate of more than 200 m/s are set, d) particle temperatures are set such that on incidence on the substrate surface the particles have a temperature at least 5% above the melting point of the ceramic for application in Kelvin, e) the amount of the spray adjunct and passage speed of the plasma burner are set such that on a single pass of the substrate a layer thickness of less than 100 ?m is achieved, f) a thin and also gas-tight layer is generated on the substrate with a single pass of the substrate which has a leakage rate of less than 10−1 mbar L/(cm2 s).