发明申请
- 专利标题: Polishing pad
- 专利标题(中): 抛光垫
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申请号: US11879413申请日: 2007-07-16
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公开(公告)号: US20070264919A1公开(公告)日: 2007-11-15
- 发明人: Toshihiro Kobayashi , Toshihiro Izumi , Jun Tamura , Takuya Nagamine , Takashi Arahata
- 申请人: Toshihiro Kobayashi , Toshihiro Izumi , Jun Tamura , Takuya Nagamine , Takashi Arahata
- 专利权人: Nihon Micro Coating Company, Ltd.
- 当前专利权人: Nihon Micro Coating Company, Ltd.
- 优先权: JP2005-61735 20050307
- 主分类号: B24D11/00
- IPC分类号: B24D11/00
摘要:
A polishing pad includes a main body having a polishing surface and a backing that is affixed to the back surface of the main body. The elasticity of the main body is within the range of 600 psi-16000 psi and preferably within the range of 1600 psi-16000 psi when a compressive pressure of 2 psi-16 psi is applied, and the thickness of the main body is within the range of 0.5 mm-3.0 mm. The elasticity of the backing is lower than that of the main body and exceeds 300 psi when a compressive pressure of 2 psi-16 psi is applied.
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