发明申请
US20070264919A1 Polishing pad 审中-公开
抛光垫

Polishing pad
摘要:
A polishing pad includes a main body having a polishing surface and a backing that is affixed to the back surface of the main body. The elasticity of the main body is within the range of 600 psi-16000 psi and preferably within the range of 1600 psi-16000 psi when a compressive pressure of 2 psi-16 psi is applied, and the thickness of the main body is within the range of 0.5 mm-3.0 mm. The elasticity of the backing is lower than that of the main body and exceeds 300 psi when a compressive pressure of 2 psi-16 psi is applied.
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