发明申请
- 专利标题: Semiconductor device and method of manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11798947申请日: 2007-05-18
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公开(公告)号: US20070267681A1公开(公告)日: 2007-11-22
- 发明人: Kyung Joong Joo , Han Soo Kim
- 申请人: Kyung Joong Joo , Han Soo Kim
- 优先权: KR10-2006-0044832 20060518
- 主分类号: H01L29/788
- IPC分类号: H01L29/788 ; H01L21/336
摘要:
Example embodiments are directed to a method of manufacturing a semiconductor device and a semiconductor device including a substrate including a plurality of active regions and a plurality of isolation regions between adjacent active regions, each active region including a groove, a bottom surface of the groove being below an upper surface of the active region.
公开/授权文献
- US07825461B2 Semiconductor device and method of manufacturing the same 公开/授权日:2010-11-02
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