发明申请
- 专利标题: Gas Barrier Laminated Film and Process for Producing the Same
- 专利标题(中): 气体隔层膜及其制造方法
-
申请号: US11573924申请日: 2005-04-29
-
公开(公告)号: US20070269664A1公开(公告)日: 2007-11-22
- 发明人: Hitoshi Fujii , Norio Akita , Ayumi Shibata , Daidou Chiba , Koichi Mikami , Hisashi Sakamoto
- 申请人: Hitoshi Fujii , Norio Akita , Ayumi Shibata , Daidou Chiba , Koichi Mikami , Hisashi Sakamoto
- 申请人地址: JP Shinjuku-ku
- 专利权人: Sai Nippon Printing Co., Ltd.
- 当前专利权人: Sai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Shinjuku-ku
- 优先权: JP2004-236996 20040817; JP2004-237598 20040817; JP2004-333220 20041117; JP2005-039758 20050216
- 国际申请: PCT/US05/14926 WO 20050429
- 主分类号: C07D233/60
- IPC分类号: C07D233/60
摘要:
There are provided a gas barrier laminated film, which is transparent while possessing excellent gas barrier properties and, at the same time, has excellent impact resistance, and a process for producing the same. The gas barrier laminated film comprises a base material, a vapor deposited film of an inorganic oxide provided on the base material, and a gas barrier coating film provided on the vapor deposited film. The gas barrier laminated film is characterized in that the base material on its side where the vapor deposited film is provided, has been subjected to pretreatment or primer coating treatment, and the gas barrier coating film has been formed by coating a gas barrier coating liquid onto the inorganic oxide film and then heating the coating.
公开/授权文献
信息查询