Invention Application
- Patent Title: PHASE CHANGE MEMORY CELL
- Patent Title (中): 相变存储器单元
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Application No.: US11553432Application Date: 2006-10-26
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Publication No.: US20070278538A1Publication Date: 2007-12-06
- Inventor: Te-Sheng Chao
- Applicant: Te-Sheng Chao
- Applicant Address: TW HSINCHU TW HSIN-CHU TW TAOYUAN TW HSINCHU TW HSINCHU
- Assignee: INDUSTRIAL TECHNOLOGOY RESEARCH INSTITUTE,POWERCHIP SEMICONDUCTOR CORP.,NANYA TECHNOLOGY CORPORATION,PROMOS TECHNOLOGIES INC.,WINBOND ELECTRONICS CORP.
- Current Assignee: INDUSTRIAL TECHNOLOGOY RESEARCH INSTITUTE,POWERCHIP SEMICONDUCTOR CORP.,NANYA TECHNOLOGY CORPORATION,PROMOS TECHNOLOGIES INC.,WINBOND ELECTRONICS CORP.
- Current Assignee Address: TW HSINCHU TW HSIN-CHU TW TAOYUAN TW HSINCHU TW HSINCHU
- Priority: TWTW95119642 20060602
- Main IPC: H01L29/768
- IPC: H01L29/768

Abstract:
A phase change memory cell is disclosed, including a first electrode and a second electrode, and a plurality of recording layers disposed between the first and second electrodes. The phase of an active region of each of the recording layers can be changed to a crystalline state or an amorphous state by current pulse control and hence respectively has crystalline resistance or amorphous resistance. At least two of the recording layers have different dimensions such that different combinations of the crystalline and amorphous resistance result in at least three different effective resistance values between the first and second electrodes. The phase change memory cell can be realized with the same material of the recording layers and thus can be fabricated with simple and currently developed CMOS fabrication process technologies. Furthermore, the phase change memory is easy to control due to large current programming intervals.
Public/Granted literature
- US08058702B2 Phase change memory cell Public/Granted day:2011-11-15
Information query
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