发明申请
US20070296936A1 Exposure Apparatus, Exposure Method, and Producing Method of Microdevice
有权
曝光装置，曝光方法和微型装置的制作方法
- 专利标题： Exposure Apparatus, Exposure Method, and Producing Method of Microdevice
- 专利标题（中）： 曝光装置，曝光方法和微型装置的制作方法
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申请号： US11661297申请日： 2006-01-24
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公开(公告)号： US20070296936A1公开(公告)日： 2007-12-27
- 发明人: Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
- 申请人： Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
- 申请人地址： JP TOKYO 100-8331
- 专利权人： NIKON CORPORATION
- 当前专利权人： NIKON CORPORATION
- 当前专利权人地址： JP TOKYO 100-8331
- 优先权： JP2005-016843 20050125; JP2005-043103 20050218; JP2005-236940 20050817
- 国际申请： PCT/JP2006/301001 WO 20060124
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units L1 to L13 onto an object P, comprises a correcting device which corrects a position of at least one of a plurality of images to be projected onto the object P by the plurality of optical units L1 to L13 so that displacements of the optical units L1 to L13 are compensated.
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