发明申请
US20070296937A1 ILLUMINATION LIGHT IN IMMERSION LITHOGRAPHY STEPPER FOR PARTICLE OR BUBBLE DETECTION
审中-公开
用于颗粒或泡沫检测的浸没式平台步进器中的照明灯
- 专利标题: ILLUMINATION LIGHT IN IMMERSION LITHOGRAPHY STEPPER FOR PARTICLE OR BUBBLE DETECTION
- 专利标题(中): 用于颗粒或泡沫检测的浸没式平台步进器中的照明灯
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申请号: US11426458申请日: 2006-06-26
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公开(公告)号: US20070296937A1公开(公告)日: 2007-12-27
- 发明人: Toshiharu Furukawa , Mark C. Hakey , Steven J. Holmes , David V. Horak , Charles W. Koburger , Peter H. Mitchell
- 申请人: Toshiharu Furukawa , Mark C. Hakey , Steven J. Holmes , David V. Horak , Charles W. Koburger , Peter H. Mitchell
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
Embodiments of the invention present a system, method, etc. for illumination light in an immersion lithography stepper for particle or bubble detection. More specifically, embodiments herein provide an immersion lithography expose system comprising a wafer holder for holding a wafer, an immersion liquid for covering the wafer, an immersion head to dispense and contain said immersion liquid, and a light source adapted to lithographically expose a resist on the wafer. The system also comprises a light detector at a first location of the immersion head and a laser source at a second location within said immersion head.