Invention Application
- Patent Title: METHOD OF MANUFACTURING SUSPENSION STRUCTURE AND CHAMBER
- Patent Title (中): 制造悬架结构和室的方法
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Application No.: US11550780Application Date: 2006-10-18
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Publication No.: US20070298581A1Publication Date: 2007-12-27
- Inventor: Yu-Fu Kang
- Applicant: Yu-Fu Kang
- Priority: TW095122564 20060622
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A method of manufacturing a suspension structure including providing a substrate, forming a hole and a sacrificial layer filling the hole on the substrate, forming a patterned photoresist layer on the substrate and the sacrificial layer, the patterned photoresist layer exposing a part of the substrate and the sacrificial layer, forming a structure layer on the substrate, the patterned photoresist layer, and the sacrificial layer, performing a lift off process to remove the patterned photoresist layer and the structure layer above the photoresist pattern, and performing a dry etch process to remove the sacrificial layer in order to make the structure layer and the hole become the suspension structure and the chamber.
Public/Granted literature
- US07393784B2 Method of manufacturing suspension structure and chamber Public/Granted day:2008-07-01
Information query
IPC分类: