发明申请
- 专利标题: Methods of Etching Polymeric Materials Suitable for Making Micro-Fluid Ejection Heads and Micro-Fluid Ejection Heads Relating Thereto
- 专利标题(中): 蚀刻适用于制造微流体喷射头和微流体喷射头的聚合材料的方法
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申请号: US11456231申请日: 2006-07-10
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公开(公告)号: US20080007595A1公开(公告)日: 2008-01-10
- 发明人: John William Krawczyk , Andrew Lee McNees , Girish Shivaji Patil
- 申请人: John William Krawczyk , Andrew Lee McNees , Girish Shivaji Patil
- 主分类号: B41J2/16
- IPC分类号: B41J2/16
摘要:
A micro-fluid ejection head structure, methods for making micro-fluid ejection head structures, and methods for etching polymeric nozzle plates. One such micro-fluid ejection head structuring includes a substrate having a plurality of fluid ejection actuators. A thick film layer is attached adjacent the substrate. The thick film layer has a fluid chamber and a fluid flow channel capable of providing fluid to the fluid chamber. A polymeric nozzle plate is attached adjacent the thick film layer. The polymeric nozzle plate includes a nozzle capable of being in fluid communication with one or more of the fluid flow chambers. The nozzle is a plasma etched nozzle defined by a photoresist mask layer.
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